摘要
Schottky barrier (SB) source/drain (S/D) nanowire field-effect transistors (FETs) were fabricated with lateral silicidation process, and their nanowire-width and dopant-species dependences were investigated systematically by means of electrical characterization and physical analyses. Carrier transport characteristics of these nanowire FETs showed a nanowire-width dependence and its dependence varied among dopant species. The degree of the lateral silicidation process also showed nanowire-width and dopant-species dependences. We found that the carrier transport mechanisms depending on S/D dopant species and nanowire width can be attributed to the difference of the lateral silicidation progress.
- 出版日期2012-4