摘要

The adsorption and dissociation processes of H2O on the Ga-rich GaAs(001)-(4 x 2) surface have been investigated at the PBE/def2-TZVPP and PBE-D3(BJ)/def2-TZVPP levels of theory. A Ga7As8H11 cluster has been employed to model the Ga-rich GaAs(001)-(4 x 2) surface. According to our computations, a chemisorbed state is formed initially. And then, the adsorbed H2O molecule will dissociate to OH radical and H atom after overcoming the corresponding barriers on the Ga2As8H11 cluster. Furthermore, the functionals of B3LYP, B3LYP-D3(BJ), and M06-2X have also been compared for evaluating the relative energies.