Multilayer deposition of ceramic and metal at room temperature using nanoparticle deposition system (NPDS) and planarization process

作者：Chun Doo Man; Kim Chung Soo; Choi Jung Oh; Lee Gil Yong; Lee Caroline Sunyong; Ahn Sung Hoon^*

来源：International Journal of Advanced Manufacturing Technology, 2014, 72(1-4): 41-46.

DOI：10.1007/s00170-013-5327-9

• Nanoparticle deposition system (NPDS)
• Room temperature processing
• Metal and ceramic deposition
• Multilayer deposition
• Planarization

Functional metal and ceramic thin films are widely used in application fields including electronics, biomedical devices, sensors, and actuators. The prevalence of polymers and organic materials is increasing, and low-temperature processing is becoming more desirable. Nanoparticle deposition is a room-temperature deposition process for metals and ceramics. Here, we report the growth of Sn, Al2O3, and TiO2 thin films under the same nanoparticle deposition process conditions. The material properties of the metal and ceramic layers were characterized, and multilayer stacks of Sn/Al2O3/Sn on silicon, TiO2/Al2O3/Sn on silicon, and TiO2/Al2O3 on sapphire were fabricated. These results show that multilayer deposition can be achieved at room temperature simply by changing the materials while maintaining the same process conditions. Planarization was carried out following the growth of each layer, and a uniform thickness of each film in the multilayer stack was achieved.

• 出版日期2014-4