A finite element analysis of surface-stress effects on measurement of the Si lattice parameter

作者:Quagliotti D*; Mana G; Massa E; Sasso C; Kuetgens U
来源:Metrologia, 2013, 50(3): 243-248.
DOI:10.1088/0026-1394/50/3/243

摘要

A stress exists in solid surfaces even if the underlying bulk material is stress-free. This paper investigates the effect of surface stress on the value of the Si lattice parameter measured by combined x-ray and optical interferometry. An elastic-film model has been used to provide a surface load in a finite element model on the x-ray interferometer crystal. Eventually, an interferometer design is proposed to determine a measurement where the effect of the surface stress is deemed to be detected.

  • 出版日期2013-6