Deposition of nanostructured fluorocarbon plasma polymer films by RF magnetron sputtering of polytetrafluoroethylene

作者：Kylian Ondrej^*; Drabik Martin; Polonskyi Oleksandr; Cechvala Juraj; Artemenko Anna; Gordeev Ivan; Choukourov Andrei; Matolinova Iva; Slavinska Danka; Biederman Hynek

来源：Thin Solid Films, 2011, 519(19): 6426-6431.

DOI：10.1016/j.tsf.2011.04.213

• Super-hydrophobicity
• Radio-frequency magnetron sputtering
• Polytetrafluoroethylene
• Mass spectrometry
• X-ray photoelectron spectroscopy

The RF magnetron sputtering of polytetrafluoroethylene target is studied with the aim to find out conditions leading to the deposition of super-hydrophobic thin films. It is shown that such coatings can be prepared at elevated pressures and a longer distance between the sputtered target and the substrate. This is explained by an increase in the density of longer C(x)F(y) molecules that reach the substrate and a lower flux of ions and CF(2) radicals on the surface of growing film under such deposition conditions, as observed by optical emission spectroscopy and mass spectrometry. Such changes in plasma composition result in a deposition of rough films having F/C ratio close to 2 as observed by scanning electron microscopy and X-ray photoelectron spectroscopy, respectively. These findings clearly distinguish our results from the previous investigations of polytetrafluoroethylene sputtering performed at shorter distances from the target, where either low F/C ratio or low roughness of the deposited films did not allow reaching super-hydrophobic character of the coatings.

• 出版日期2011-7-29