Age hardening in arc-evaporated ZrAlN thin films

作者：Rogstrom L^*; Johnson L J S; Johansson M P; Ahlgren M; Hultman L; Oden M

来源：Scripta Materialia, 2010, 62(10): 739-741.

DOI：10.1016/j.scriptamat.2010.01.049

• PVD
• Nanoindentation
• TEM
• Hardness
• Thin films

Zr(0.44)Al(0.56)N(1.20) films were deposited by reactive arc evaporation on WC-Co substrates. As-deposited films have a defect-rich NaCl-cubic and wurtzite phase mixture. During annealing at 1100 degrees C the films undergo simultaneous recovery of the ZrN-rich c-ZrAlN nanoscale domains and formation of semicoherent w-ZrAlN nanobricks, while the excess nitrogen is released. This process results in an age hardening effect as high as 36%, as determined by nanoindentation. At 1200 degrees C, the w-AlN recrystallizes and the hardening effect is lost.

• 出版日期2010-5