Scanning digital lithography providing high speed large area patterning with diffraction limited sub-micron resolution

作者：Wen Sy Bor^*; Bhaskar Arun; Zhang Hongjie

来源：Journal of Micromechanics and Microengineering, 2018, 28(7): 075011.

DOI：10.1088/1361-6439/aabb1f

• nanofabrication
• digital lithography
• sub-micron resolution
• space filter system
• diffraction mode control
• spatial light modulator
• diffraction-limited resolution

A scanning digital lithography system using computer controlled digital spatial light modulator, spatial filter, infinity correct optical microscope and high precision translation stage is proposed and examined. Through utilizing the spatial filter to limit orders of diffraction modes for light delivered from the spatial light modulator, we are able to achieve diffraction limited deep submicron spatial resolution with the scanning digital lithography system by using standard one inch level optical components with reasonable prices. Raster scanning of this scanning digital lithography system using a high speed high precision x-y translation stage and piezo mount to real time adjust the focal position of objective lens allows us to achieve large area sub-micron resolved patterning with high speed (compared with e-beam lithography). It is determined in this study that to achieve high quality stitching of lithography patterns with raster scanning, a high-resolution rotation stage will be required to ensure the x and y directions of the projected pattern are in the same x and y translation directions of the nanometer precision x-y translation stage.

• 出版日期2018-7