Different Variations of Neel Temperature T-N and Kondo Temperature T-K in the Alloy System Ce(Ru1-xOsx)(2)Al-10 under Uniaxial Pressure

作者：Takeuchi Takashi; Hayashi Kyosuke; Umeo Kazunori; Takabatake Toshiro^*

来源：Journal of the Physical Society of Japan, 2018, 87(5): 054702.

DOI：10.7566/JPSJ.87.054702

We report magnetic, transport, and specific-heat measurements for single crystals of the antiferromagnetic (AFM) Kondo semiconductor alloy series Ce(Ru1-xOsx)(2)Al-10 (0 <= x <= 1), which crystallize into an orthorhombic structure. The specific-heat and resistivity data show that the isoelectronic substitution does not damage the hybridization gap or the AFM transition. The Kondo temperature T-K increases linearly with x, whereas the Neel temperature T-N exhibits a maximum value of 29.2 K for x = 0.71. Under increasing uniaxial pressure P parallel to a, T-N increases for x = 0 but decreases for x = 1, while T-K increases in the entire range of x. Under P parallel to b, in contrast, T-N increases steadily in the whole range of x while T-K remains unchanged for each x. The strongly anisotropic change in T-N indicates the presence of another mechanism to enhance T-N in this system in addition to the anisotropic hybridization of the 4 f state with conduction bands.

• 出版日期2018-5-15