摘要

Conventional three-dimensional (3D) microstructures such as arcs or spiralities are generally fabricated using some complicated methods like LIGA or two-photon lithography. In this paper, a new approach of fabricating 3D microstructures is provided. The process is based on UV-LIGA technology yet including a novel reformation method in the post bake procedure. The fabrication process started with coating SU-8 as thick as 500 microns on the silicon substrate, and then it was followed by an exposure with patterned mask under UV light. Subsequently, a force on the exposed SU-8 photo resist was applied in the post-bake process. By adjusting the amount of force, the way in which the force was placed and the exposure dose, we directly fabricated some complicated three-dimensional structures on the SU-8 photo resist after development of the SU-8. We call this microfabrication method as Force-LIGA (F-LIGA). Firstly, orthogonal experiment method conducted to optimize the hot-press process is presented, and then we give some experiment examples using F-LIGA approach and discuss the relationships among the exposure time, pressure and the profile of microstructures. The fabrication process can be used widely in making useful three-dimensional devices.

  • 出版日期2006-7