Simulated plasma immersion ion implantation processing of thin wires

作者：Lejars A^*; Manova D; Maendl S; Duday D; Wirtz T

来源：Journal of Applied Physics, 2010, 108(6): 063308.

DOI：10.1063/1.3485812

• ion density
• plasma density
• plasma immersion ion implantation
• plasma sheaths
• plasma simulation
• plasma transport processes
• substrates
• wires

In plasma immersion ion implantation, the dependencies of sheath expansion and ion flux density on substrate geometry are well established. However, effects of extreme diameter variations have not been investigated explicitly. Using an analytical simulation code assuming an infinite mean free path, the sheath expansion, ion flux density, and resulting substrate temperature are explored down to wire diameters of 150 mu m. Comparing the results for planar substrates and cylindrical, thin wires, a reduction in the sheath width up to a factor of 10, a faster establishing of a new equilibrium sheath position, and an increase in the ion fluence by a factor of 100 is encountered. The smaller plasma sheath allows for a denser packing of wires during the treatment than for planar substrates. Additionally, the implantation time is reduced, allowing a fast wire transport through the chamber, further increasing the throughput.

• 出版日期2010-9-15