Nanostructures of mixed-phase boron nitride via biased microwave plasma-assisted CVD

作者：Huang Po Chih; Wong Ming Show^*

来源：Vacuum, 2014, 100: 66-70.

DOI：10.1016/j.vacuum.2013.07.042

• Boron nitride
• Nanostructures
• Chemical vapor deposition
• Plasma etching

Boron nitride films and nanostructures are deposited by the reaction of B2H6 and NH3 in H-2 via biased microwave plasma-assisted chemical vapor deposition. One-dimensional boron nitride nanostructures (BNNSs) are observed on the BN layers by the processing of diamond/BN multilayer under ion-bombardment and plasma etching. At a substrate bias of -100 V, the morphologies of the BNNSs evolve from dense film to nanocorns to nanotips, when the number of the diamond/BN bi-layer increases. Various phases of boron nitride including amorphous-BN, hexagonal h-BN, turbostratic t-BN, rhombohedral r-BN, explosion E-BN, wurtzitic w-BN and cubic c-BN are detected in the BNNSs. The BN nanotips observed are considered to result from the tip structure growth from the combined effects of ion bombardment and plasma etching.

• 出版日期2014-2
• 单位东华大学