Analysis of laser induced thermal mechanical relationship of   HfO(2)/SiO(2) high reflective optical thin film at 1064 nm

Dai Gang<sup>*</sup>; Chen Yanbei; Lu Jian; Shen Zhonghua; Ni Xiaowu

doi:10.3788/COL20090707.0601

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Analysis of laser induced thermal mechanical relationship of HfO(2)/SiO(2) high reflective optical thin film at 1064 nm

作者：Dai Gang^*; Chen Yanbei; Lu Jian; Shen Zhonghua; Ni Xiaowu

来源：Chinese Optics Letters, 2009, 7(7): 601-604.

DOI：10.3788/COL20090707.0601

摘要

A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO(2)/SiO(2) high reflective (HR) film is investigated to calculate the thermal field of the film. The thermal-mechanical relationships are discussed to predict the laser damage area of optical thin film under long pulse high energy laser irradiation.