A study of GaN MOSFETs with atomic-layer-deposited Al2O3 as the gate dielectric

作者：Feng Qian; Xing Tao; Wang Qiang; Feng Qing; Li Qian; Bi Zhi-Wei; Zhang Jin-Cheng; Hao Yue^*

来源：Chinese Physics B, 2012, 21(1): 017304.

DOI：10.1088/1674-1056/21/1/017304

• gallium nitride
• metal-oxide-semiconductor field-effect transistor
• atomic-layer deposition
• aluminium oxide

Accumulation-type GaN metal-oxide-semiconductor field-effect transistors (MOSFETs) with atomic-layer-deposited Al2O3 gate dielectrics are fabricated. The device, with atomic-layer-deposited Al2O3 as the gate dielectric, presents a drain current of 260 mA/mm and a broad maximum transconductance of 34 mS/mm, which are better than those reported previously with Al2O3 as the gate dielectric. Furthermore, the device shows negligible current collapse in a wide range of bias voltages, owing to the effective passivation of the GaN surface by the Al2O3 film. The gate drain breakdown voltage is found to be about 59.5 V, and in addition the channel mobility of the n-GaN layer is about 380 cm(2)/Vs, which is consistent with the Hall result, and it is not degraded by atomic-layer-deposition Al2O3 growth and device fabrication.

• 出版日期2012-1
• 单位西安电子科技大学