New Top-Down Approach for Fabricating High-Aspect-Ratio Complex Nanostructures with 10 nm Scale Features

作者：Jeon Hwan Jin; Kim Kyoung Hwan; Baek Youn Kyoung; Kim Dae Woo; Jung Hee Tae^*

来源：Nano Letters, 2010, 10(9): 3604-3610.

DOI：10.1021/nl1025776

• Nanopattern
• nanostructure
• lithography
• nanoimprint
• ion bombardment

We describe a new patterning technique, named "secondary sputtering lithography" that enables fabrication of ultrahigh-resolution (ca. 10 nm) and high aspect ratio (ca. 15) patterns of three-dimensional various shapes. In this methodology, target materials are etched and deposited onto the side surface of a prepatterned polymer by using low Ar ion bombarding energies, based on the angular distribution of target particles by ion-beam bombardment. After removal of the prepatterned polymer, high aspect ratios and high-resolution patterns of target materials are created.

• 出版日期2010-9