Atomic layer deposition of high-k dielectrics on carbon nanoparticles

作者:Tamm Aile*; Peikolainen Anna Liisa; Kozlova Jekaterina; Maendar Hugo; Aidla Aleks; Rammula Raul; Aarik Lauri; Roosalu Kaspar; Lu Jun; Hultman Lars; Koel Mihkel; Kukli Kaupo; Aarik Jaan
来源:Thin Solid Films, 2013, 538: 16-20.
DOI:10.1016/j.tsf.2012.09.071

摘要

Carbon nanoparticles were synthesized from 5-methylresorcinol and formaldehyde via base catalysed polycondensation reaction and distributed over silicon oxide wafers and aluminium oxide thin films. These particles essentially possessed monocrystalline graphite structure. The particles were covered by hafnium oxide thin films in metal chloride based atomic layer deposition process carried out at 300 degrees C. Upon deposition of HfO2, thin crystalline metal oxide layer containing mostly cubic phase was formed. At the same time, deposition of the metal oxide caused reduction of the sizes of graphite particles and essential increase in the disorder in carbon.

  • 出版日期2013-7-1