Low-cost trench isolation technique for reverse blocking IGBT using boron nitride doping wafers

作者:Vellvehi M*; Galvez J L; Perpina X; Jorda X; Godignon P; Millan J
来源:Microelectronic Engineering, 2010, 87(11): 2323-2327.
DOI:10.1016/j.mee.2010.03.011

摘要

A new fabrication process for IGBT devices with reverse blocking capability (RB-IGBT) is presented in this paper. The trench isolation approach which provides the reverse blocking capability has been implemented using solid source as doping technique (Boron doping wafers), resulting in a low-cost process in both starting material and time-consuming aspects. The feasibility of the fabrication technique has been validated with the electrical measurements of the prototype devices.

  • 出版日期2010-11