Analysis of the Metal/Polymer Bi-layer Structure during Demolding Process of Nanoimprinting

作者：Wang Qing^*; Zheng Xu; Zhang Rui; Zhang Jintao; Ma Lijun; Liu Huawei

来源：Journal of Photopolymer Science and Technology, 2015, 28(6): 763-767.

DOI：10.2494/photopolymer.28.763

• Nanoimprint
• bi-layer structure
• finite element method
• von Mises stress
• deformation

Nanoimprinting has become one of the advanced patterning methods for fabricating metal/polymer bi-layer nanostructures used for functional materials. How to control and avoid the emergence of various defects in nanoimprinting process is one of the key issues to improve the quality of nanofabrication. However, little attention has been paid to the demolding process which most likely lead to defects. In this paper, von Mises stress and deformation of bi-layer structure during demolding process were simulated and analyzed. In the finite element analysis model, the adhesion and friction forces were considered. The results presented that stress concentration occurred at four locations in the bi-layer structure. The curves of stresses were plotted to explain the stress concentration and deformation. By comparing the stresses at key locations, related regularities about how to avoid stress concentration were proposed. Depending on these regularities, corresponding measures can be applied to avoid the delamination defects in bi-layer structure in practice.

• 出版日期2015
• 单位山东科技大学