摘要

In this work, we present a detailed analysis of the microstructure and magnetic properties of 50 +/- 2 nm thick polycrystalline Fe100-xGax (10 <= x <= 35) films. Two sets of Fe100-xGax films were fabricated on Si < 1 0 0 > substrates with and without a forming field H-f present. Microstructural properties were studied using X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDS) and conversion electron Mossbauer spectroscopy (CEMS). Magnetic properties were studied using the magneto optical Kerr effect (MOKE) magnetometer. For all films, the < 1 1 0 > texture normal to the film plane was observed from XRD. No peaks corresponding to the ordered D0(3) or L1(2) phases were observed from XRD. Using CEMS, the disordered A2 phase was confirmed in all films. It was found that the magnetostriction in Set-1 (forming field H-f = 0) films was similar to 40-50% higher compared to the Set-2 (H-f not equal 0) films over the whole Ga composition range studied. Both film sets have a strong dependence of saturation field H-s on Ga composition. Set-1 films were magnetically isotropic but a weak uniaxial anisotropy was observed in Set-2 films. The saturation field H-s in Set-2 films was significantly lower compared to the Set-1 films. It was concluded that the Hf reduced H-s but also reduced effective saturation magnetostriction constant lambda(eff) in the films.

  • 出版日期2011-3-1