摘要
The magnetization of Fe/Si multilayers, grown by thermal evaporation in an ultrahigh vacuum system, was investigated at high temperatures. Magnetization and its temperature dependence up to a high temperature of 800 K depend on individual Fe layer thickness d(Fe). This dependence is the result of the formation of an Fe-Si interface layer (nonmagnetic phase) during the synthetic procedure. The fraction of this Fe-Si nonmagnetic phase is estimated versus dFe. At temperatures higher than 400 K an irreversible decrease in the magnetization occurs. A quantitative analysis of this irreversible behavior is proposed in terms of an exponential diffusion-like kinetic equation for the reaction that produces the Fe-Si nonmagnetic phase. The coefficients of the rate equation are the activation energy E(a) and the prefactor D(0), which have been determined for different d(Fe).
- 出版日期2008-11-1