Scalability and Stability Enhancement in Self-Aligned Top-Gate Indium-Zinc-Oxide TFTs With Al Reacted Source/Drain

作者：Liang, Ting; Shao, Yang; Lu, Huiling; Zhou, Xiaoliang; Deng, Xuan; Zhang, Shengdong^*

来源：IEEE Journal of the Electron Devices Society, 2018, 6(1): 680-684.

DOI：10.1109/JEDS.2018.2837352

• Amorphous indium-zinc-oxide (a-IZO)
• self-aligned
• top-gate
• aluminum reaction

A self-aligned fabrication process for top-gate amorphous indium-zinc-oxide (a-IZO) thinfilm transistors (TFTs) is demonstrated. Aluminum (Al) thermal treatment is employed to dope the a-IZO layer and thus form the self-aligned source/drain regions. The results show that the sheet resistance of the Al-treated a-IZO layer can be as low as 360 Omega/rectangle. The fabricated top-gate TFTs typically have a mobility of 16.84 cm(2)/V . s, subthreshold swing of 0.14 V/dec and on/off current ratio of > 10(9). The Al-treated TFTs show a significant scalability and stability enhancement compared to the conventional Ar plasma-treated ones. This enhancement can be attributed to the thin Al2O3 layer formed on source-drain area that blocks the diffusion of hydrogen or H2O from the passivation layer into the source-drain and channel regions.

• 出版日期2018
• 单位北京大学深圳研究生院; 北京大学