Deposition of fluorocarbon films by Pulsed Plasma Thruster on the anode side

作者：Zhang, Rui^*; Zhang, Daixian; Zhang, Fan; He, Zhen; Wu, Jianjun

来源：Applied Surface Science, 2013, 270: 352-358.

DOI：10.1016/j.apsusc.2013.01.029

• Pulsed Plasma Thruster
• Plume deposition
• Fluorocarbon film
• XPS
• SPM

Fluorocarbon thin films were deposited by Pulsed Plasma Thruster at different angles on the anode side of the thruster. Density and velocity of the plasma in the plume of the Pulsed Plasma Thruster were determined using double and triple Langmuir probe apparatus respectively. The deposited films were characterized by X-ray photoelectron spectroscopy (XPS), scanning probe microscope (SPM) and UV-vis spectrometer. Low F/C ratio (0.64-0.86) fluorocarbon films are deposited. The F/C ratio decreases with angle increasing from 0 degree to 30 degree; however it turns to increase with angle increasing from 45 degree to 90 degree. The films deposited at center angles appear rougher compared with that prepared at angles beyond 45 degree. These films basically show having strong absorption properties for wavelength below 600 nm and having enhanced reflective characteristics. Due to the influence of the chemical composition and the surface morphology of the films, the optical properties of these films also show significant angular dependence.

• 出版日期2013-4-1
• 单位中国人民解放军国防科学技术大学