Modifying the properties of fluorinated amorphous films using argon by filtered cathodic vacuum arc

作者：Lin Yu Hung; Syue Yang Chih; Lin Hong Da; Chen Uei Shin; Chang Yee Shyi; Chen Jiann Ruey; Shih Han C^*

来源：Applied Surface Science, 2008, 255(5): 2139-2142.

DOI：10.1016/j.apsusc.2008.07.084

• a-C:F films
• Contact angle
• Filtered cathodic vacuum arc

Fluorine-doped amorphous carbon (a-C:F). films were deposited using a 90 degrees-bend magnetic. filtered cathodic arc plasma system with CF(4) as a precursor and the addition of argon gas. The microstructure, composition and chemical bonding nature of the a-C:F. films were investigated by Raman scattering spectroscopy and X-ray photoelectron spectroscopy. The surface morphology and roughness of a-C:F. films were observed through an atomic force microscope. Hardness was measured by nano-indentation. Water contact angles were measured by the sessile drop method. The. fluorine content of the. films increases with the argon. flux. Because of the increase of the. fluorine content in the. films, the. film surface becomes rougher; the hardness decreases, and the contact angle increases from 76.2 degrees to 87.8 degrees. This work demonstrates that an appropriate amount of the admitted argon to the plasma would promote the doping of the. films with. fluorine, and influences the properties of the a-C:F. films.

• 出版日期2008-12-30
• 单位清华大学