Annealing Temperature and Ultraviolet Irradiation Effect on the Ferroelectric Properties of Bi3.25La0.75Ti3O12 Thin Films

作者：Wu Xiumei^*; Zhai Ya; Xu Mingxiang; Kan Yi

来源：Journal of Nanoscience and Nanotechnology, 2012, 12(8): 6567-6570.

DOI：10.1166/jnn.2012.5439

• Ferroelectric Thin Films
• Temperature
• Leakage Current

Bi3.25La0.75Ti3O12 thin films were prepared on Pt/Ti/SiO2/Si substrates by the metal organic decomposition method. The structural characterizations and the surface morphology observations were carried out applying X-ray diffraction and atomic force microscope, respectively. The annealing temperature and the ultraviolet irradiation effect on the ferroelectric properties were studied. It was found that the remnant polarization (P-r) and the coercive field (E-c) increased with the increase of the applied electric field (E) for all films. With the annealing temperature increasing from 670 degrees C to 750 degrees C, the increase tendency of P-r(E) and E-c (E) got enhanced from 670 degrees C to 720 degrees C, followed by weakened from 720 degrees C at 750 degrees C. These phenomena could be well explained by the different internal strain in films. The remnant polarization and the coercive field showed an obvious decrease when the top electrodes of the thin films were illuminated with UV light due to the screening effect of trapped charge carries.

• 出版日期2012-8
• 单位东南大学; 南京大学