Bottom-up fabrication of diamond nanowire arrays

作者：Janssen Wiebke; Faby Sebastian; Gheeraert Etienne^*

来源：Diamond and Related Materials, 2011, 20(5-6): 779-781.

DOI：10.1016/j.diamond.2011.03.024

• Diamond
• Etching
• ICP plasma
• Nanowire array
• Dewetting

Diamond nanowires are fabricated in a bottom-up approach by anisotropic oxygen plasma etching. A hexagonally arranged network polystyrene spheres of 500 nm to 2 mu m in diameter was deposited on diamond and served as shadow mask during 10 nm nickel evaporation. This led, after dewetting at 650 degrees C, to a hexagonal network of Ni droplets of 60 to 80 nm in diameter, and was used as etching mask to create the network of vertically aligned diamond nanowires. Influence of film thickness, annealing time, and polystyrene sphere diameter were studied. The plasma etching process was also applied to fabricate diamond microdisks on silicon post.

• 出版日期2011-6