Non-destructive and quantitative imaging of a nano-structured microchip by ptychographic hard X-ray scanning microscopy

作者：Schropp A^*; Boye P; Goldschmidt A; Hoenig S; Hoppe R; Patommel J; Rakete C; Samberg D; Stephan S; Schoeder S; Burghammer M; Schroer C G

来源：Journal of Microscopy, 2011, 241(1): 9-12.

DOI：10.1111/j.1365-2818.2010.03453.x

• Hard X-ray microscopy
• microelectronics
• nondestructive imaging
• ptychography

P>We used hard X-ray scanning microscopy with ptychographic coherent diffraction contrast to image a front-end processed passivated microchip fabricated in 80 nm technology. No sample preparation was needed to image buried interconnects and contact layers with a spatial resolution of slightly better than 40 nm. The phase shift in the sample is obtained quantitatively. With the additional knowledge of the elemental composition determined in parallel by X-ray fluorescence mapping, quantitative information about specific nanostructures is obtained. A significant enhancement in signal-to-noise ratio and spatial resolution is achieved compared to conventional hard X-ray scanning microscopy.

• 出版日期2011-1