Morphological characteristics of Ni sulfides fabricated by chemical vapor deposition

作者：Cho Gyu bong; Bae Kang woo; Nam Tae hyun^*; Lee Jun hee

来源：Journal of Alloys and Compounds, 2009, 477(1-2): L24-L27.

DOI：10.1016/j.jallcom.2008.10.128

• CVD
• Ni sulfides
• Morphology
• Electrochemical reaction

Ni sulfides were formed by reacting Ni substrates with gaseous sulfur, and then their microstructures were investigated. Ni sulfides consisted of four distinct layers, i.e., the topmost thin film layer (I), dense thick film layer (II), coarse particulate layer (III), and innermost fine particulate layer (IV). XRD and electrochemical analyses demonstrated that layers I, II and IV were NiS(2), NiS and Ni(3)S(2), respectively and layer III was a transient layer where Ni(3)S(2) was converted into NiS by Ni(3)S(2) S -> NiS reaction.

• 出版日期2009-5-27