Built-In Self-Test Methodology With Statistical Analysis for Electrical Diagnosis of Wearout in a Static Random Access Memory Array

作者：Kim Woongrae^*; Chen Chang Chih; Kim Dae Hyun; Milor Linda

来源：IEEE Transactions on Very Large Scale Integration (VLSI) Systems, 2016, 24(7): 2521-2534.

DOI：10.1109/TVLSI.2015.2513369

• Back-end time-dependent dielectric breakdown (TDDB)
• bias temperature instability (BTI)
• built-in self-test (BIST)
• electromigration (EM)
• gate oxide breakdown
• SRAM reliability
• stress-induced voiding (SIV)

We present an electrical diagnosis methodology for a variety of wearout mechanisms, including back-end time-dependent dielectric breakdown (TDDB), electromigration, stress-induced voiding, gate oxide TDDB, and bias temperature instability, in an SRAM array. First, the built-in self-test (BIST) system detects wearout and identifies the locations of the faulty cells. Next, the physical location of the failure sites within SRAM cells is determined. There are some fault sites for different mechanisms which result in exactly the same electrical failure signature. For these faulty sites, the cause of failure probabilities for each wearout mechanism is estimated by matching the observed failure rate from BIST and the failure rate distribution computed by simulation and as a function of circuit use scenarios. The estimation of wearout distributions is helpful in determining the wearout limiting mechanisms in the field.

• 出版日期2016-7