摘要
A numerical calculation of the patch-field distribution across nanopatchwork surfaces has been developed. Results show that the low work-function nanosize zones are intrinsically protected by an electrostatic screen, which is induced by the surrounding area having a higher work-function. In presence of an applied field, during field emission, a preferential opening of the surface barrier above the nanopatches induces a field emission array of parallel e-beams whose geometrical distribution is defined by the positions of the nanopatches.
- 出版日期2010-8-15