Nanopatchwork cathodes: Patch-fields and field emission of nanosize parallel e-beams

作者:Binh Vu Thien*; Mouton R; Adessi Ch; Semet V; Cahay M; Fairchild S
来源:Journal of Applied Physics, 2010, 108(4): 044311.
DOI:10.1063/1.3475343

摘要

A numerical calculation of the patch-field distribution across nanopatchwork surfaces has been developed. Results show that the low work-function nanosize zones are intrinsically protected by an electrostatic screen, which is induced by the surrounding area having a higher work-function. In presence of an applied field, during field emission, a preferential opening of the surface barrier above the nanopatches induces a field emission array of parallel e-beams whose geometrical distribution is defined by the positions of the nanopatches.

  • 出版日期2010-8-15