Atomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminates

作者：Tamm Aile^*; Heikkila Mikko; Kemell Marianna; Kozlova Jekaterina; Kukli Kaupo; Sammelselg Vaino; Ritala Mikko; Leskela Markku

来源：Thin Solid Films, 2010, 519(2): 666-673.

DOI：10.1016/j.tsf.2010.08.111

• Atomic layer deposition
• X ray scattering
• Diffraction and reflection
• Crystallization
• Electrical transport (conductivity resistivity mobility etc.)
• Rare earth metals
• Oxides
• Thin film structures
• Insulating films

ZrO2 and Er2O3 thin films and nanolaminates were grown by atomic layer deposition from tris(2,2 6 6-tetramethyl-3 5-heptanedionato)erbium bis(methylcyclopentadienyl)methoxymethylzirconium and ozone as precursors at 350 C. Nanolaminates consisted of 3-8 nm thick ZrO2 and Er2O3 layers alternately deposited on planar substrates and on three-dimensional substrates with aspect ratio 1 20 The erbium content was 5-15 at.% ZrO2-Er2O3 films crystallized already in as-deposited states Upon annealing at 650 C the films were stabilized i

• 出版日期2010-11-1