Unveiling the mechanisms of dressed-photon-phonon etching based on hierarchical surface roughness measure

作者：Naruse Makoto^*; Yatsui Takashi; Nomura Wataru; Kawazoe Tadashi; Aida Masaki; Ohtsu Motoichi

来源：Applied Physics Letters, 2013, 102(7): 071603.

DOI：10.1063/1.4793233

Dressed-photon-phonon (DPP) etching is a disruptive technology in planarizing material surfaces because it completely eliminates mechanical contact processes. However, adequate metrics for evaluating the surface roughness and the underlying physical mechanisms are still not well understood. Here, we propose a two-dimensional hierarchical surface roughness measure, inspired by the Allan variance, that represents the effectiveness of DPP etching while conserving the original two-dimensional surface topology. Also, we build a simple physical model of DPP etching that agrees well with the experimental observations, which clearly shows the involvement of the intrinsic hierarchical properties of dressed photons, or optical near-fields, in the surface processing.

• 出版日期2013-2-18