Atmospheric-pressure argon plasma etching of spin-coated 3,4-polyethylenedioxythiophene:polystyrenesulfonic acid (PEDOT:PSS) films for cupper phtalocyanine (CuPc)/C-60 heterojunction thin-film solar cells

作者：Ino Tomohisa; Hayashi Tatsuya; Ueno Keiji; Shirai Hajime^*

来源：Thin Solid Films, 2011, 519(20): 6834-6839.

DOI：10.1016/j.tsf.2011.04.042

• Organic thin-film solar cells
• PEDOT:PSS
• CuPc/C-60
• Plasma etching
• Real time ellipsometric study

Depth profiles of the optical constants, carrier mobility, and carrier density of spin-coated 3,4-polyethylenedioxythiophene:polystyrenesulfonic acid (PEDOT:PSS) films were investigated by real-time characterization by the spectroscopic ellipsometry (SE) during argon plasma etching at atmospheric pressure. Spectral analysis revealed that homogeneous etching occurred within 10-15 nm of the top surface, followed by the appearance of a conductive PEDOT phase and surface roughning, which originated from the depth profile of the PEDOT-to-PSS molar concentration ratio. The use of the plasma-etched PEDOT:PSS layer improved relatively the performance of the copper phtalocyanine (CuPc)/C-60 organic thin-films solar cells as a hole-transport layer with higher optical transmittance by adjusting the plasma etching condition.

• 出版日期2011-8-1