Application of sputtered ruthenium nitride thin films as electrode material for energy-storage devices

作者：Bouhtiyya S; Porto R Lucio; Laik B; Boulet P; Capon F; Pereira Ramos J P; Brousse T; Pierson J F^*

来源：Scripta Materialia, 2013, 68(9): 659-662.

DOI：10.1016/j.scriptamat.2013.01.030

• Electrode material
• Ruthenium nitride
• Structure
• Reactive sputtering

RuN films that crystallized in the ZnS-like structure with [111] preferred orientation have been deposited by reactive sputtering. Preliminary results are reported on the electrochemical properties of such films as electrode materials for supercapacitors and lithium-ion batteries. Cyclic voltammetric experiments indicate an attractive capacitance value of 37 F g(-1). Moreover, galvanostatic measurements indicate that RuN films reversibly react with lithium through a conversion reaction with Ru(0) nanoparticle formation. A high capacity value of similar to 700 mAh g(-1) at C/2 rate is achievable.

• 出版日期2013-5