Lanthanum titanium oxynitride thin films

作者：Le Gendre L^*; Le Paven C; Pinel J; Fasquelle D; Carru JC; Chevire F; Tessier F; Marchand R

来源：Silicates Industriels, 2004, 69(5-6): 165-171.

• perovskite
• dielectric properties
• sputtering
• reactive plasma

Using RF-magnetron sputtering, we grew LaTiOxNy oxynitride thin films on (001) strontium titanate and glass substrates, starting from an homemade oxide target. The microwave dielectric properties of La2Ti2O7 ceramic have been investigated in order to have a reference for further studies. The coatings were characterized using X-ray diffraction and scanning electron microscopy. Films deposited on perovskite oxide substrate in a reactive plasma (N-2, Ar) at 800degreesC present a textured structure and a smooth surface. A pre-study of laser etching of LaTiOxNy material is also reported.

• 出版日期2004-6