Modular deposition chamber for in situ X-ray experiments during RF and DC magnetron sputtering

作者：Krause Baerbel^*; Darma Susan; Kaufholz Marthe; Graefe Hans Hellmuth; Ulrich Sven; Mantilla Miguel; Weigel Ralf; Rembold Steffen; Baumbach Tilo

来源：JOURNAL OF SYNCHROTRON RADIATION, 2012, 19(2): 216-222.

DOI：10.1107/S0909049511052320

• in situ X-ray measurement
• thin-film growth
• sputter deposition
• deposition chamber
• texture
• polycrystalline materials

A new sputtering system for in situ X-ray experiments during DC and RF magnetron sputtering is described. The outstanding features of the system are the modular design of the vacuum chamber, the adjustable deposition angle, the option for plasma diagnostics, and the UHV sample transfer in order to access complementary surface analysis methods. First in situ diffraction and reflectivity measurements during RF and DC deposition of vanadium carbide demonstrate the performance of the set-up.

• 出版日期2012-3