SiOx interlayer to enhance the performance of InGaZnO-TFT with AlOx gate insulator

作者：Li, Jun^*; Zhou, Fan; Lin, Hua-Ping; Zhu, Wen-Qing; Zhang, Jian-Hua; Jiang, Xue-Yin; Zhang, Zhi-Lin

来源：Current Applied Physics, 2012, 12(5): 1288-1291.

DOI：10.1016/j.cap.2012.03.013

• Thin film transistor
• InGaZnO
• SiOx interlayer
• Bias stability

We have fabricated indium-gallium-zinc (IGZO) thin film transistor (TFT) using SiOx interlayer modified aluminum oxide (AlOx) film as the gate insulator and investigated their electrical characteristics and bias voltage stress. Compared with IGZO-TFT with AlOx insulator, IGZO-TFT with AlOx/SiOx insulator shows superior performance and better bias stability. The saturation mobility increases from 5.6 cm(2)/V s to 7.8 cm(2)/V s, the threshold voltage downshifts from 9.5 V to 3.3 V, and the contact resistance reduces from 132 Omega cm to 91 Omega cm. The performance improvement is attributed to the following reasons: (1) the introduction of SiOx interlayer improves the insulator surface properties and leads to the high quality IGZO film and low trap density of IGZO/insulator interface. (2) The better interface between the channel and S/D electrodes is favorable to reduce the contact resistance of IGZO-TFT.

• 出版日期2012-9
• 单位上海大学