A simple method for shape modulation in microlens array fabrication via spin-coating process

作者：Huang, Shengzhou; Li, Mujun^*; Shen, Lianguan; Qiu, Jinfeng; Zhou, Youquan

来源：Microsystem Technologies, 2018, 24(4): 1885-1889.

DOI：10.1007/s00542-017-3571-x

• PHOTORESIST REFLOW METHOD
• LENS ARRAY
• LITHOGRAPHY
• DESIGN

In this paper, a simple method for microlens array (MLA) fabrication is presented by the modulation of spin-coating process. Firstly, micro holes with design diameters were prepared on substrate through maskless lithography based on the digital micromirror device. Next by the spin-coating of photoresist onto the substrate the meniscus concave microlens with various curvatures can be formed, and then become stable after a proper baking process. During the coating process, the photoresist was strictly confined in the micro holes and its volume could be precisely controlled by adjusting the spin-coating speed. These advantages make it very easy to obtain microlenses with different aspect ratios at precisely pre-defined diameters. Experimental results showed the effectiveness of our method. The presented method is expected to provide a novel, economic and simple strategy for shape modulation in MLA fabrication.

• 出版日期2018-4
• 单位中国科学技术大学