Understanding Strain-Induced Drive-Current Enhancement in Strained-Silicon n-MOSFET and p-MOSFET

作者：Flachowsky Stefan^*; Wei Andy; Illgen Ralf; Herrmann Tom; Hoentschel Jan; Horstmann Manfred; Klix Wilfried; Stenzel Roland

来源：IEEE Transactions on Electron Devices, 2010, 57(6): 1343-1354.

DOI：10.1109/TED.2010.2046461

• CMOS
• electrical field
• MOSFET
• mobility enhancement
• SiGe
• strain
• strained overlayer film
• strained silicon
• strained silicon-on-insulator (sSOI)
• stress
• stress memorization technique (SMT)

Strain greatly affects the electrical properties of silicon because strain changes the energy band structure of silicon. In MOSFET devices, the terminal voltages induce electrical fields, which themselves modulate the electronic band structure and interact with strain-induced changes. Applied electrical fields are used to experimentally study different state-of-the-art local and global strain techniques and reveal the different responses of n- and p-MOSFETs to the different strain techniques. It is shown that p-MOSFETs have more low-lateral-field linear drive-current enhancement and less high-lateral-field saturation drive-current enhancement at both low and high vertical fields. The situation is similar for n- MOSFETs at low vertical fields. However, at high vertical fields, n- MOSFET low-lateral-field linear drive-current enhancement is less than the high-lateral-field saturation drive-current enhancement. The origin for this behavior can be found in the different strain effects on the electronic band structure, which results in effective mass reduction and/or scattering suppression. These, in turn, contribute differently to linear and saturation drive-current enhancements in n- and p-MOSFETs.

• 出版日期2010-6