摘要

The effects of step changes in the concentration of HCO3-, Cl- and SO42- on copper pitting propagation in simulated potable waters were investigated. HCO3- and Cl- additions were found to stifle propagation of previously established pits. Raising the applied potential could restart pit growth temporarily. In contrast, SO42- was able to reactivate stifled pits without a potential increase. Stifling of pit growth upon HCO3- and Cl- additions was attributed to the formation of highly resistive malachite and copper chloride layers. The detrimental effect of SO42- was attributed to the chemical dissolution of the resistive copper chloride layer and the formation of a porous brochantite pit cap.

  • 出版日期2012