摘要

A series of TiAlN/VN nano-multilayer films were prepared by reactive magnetron sputtering method. The effects of modulation structure on the microstructural evolution, mechanical and tribological properties were investigated by X-ray diffractometer, scanning electron microscope, high-resolution transmission electron microscope, nano-indention device and high vacuum tribometer. The results show that the structure of TiAlN/VN nano-multilayer films with different modulation periods are all typical columnar crystals. Meanwhile, the insertion of the VN sublayers does not interrupt the columnar crystal growth of TiAlN sublayers. In the TiAlN/VN nano-multilayer films, TiAlN sublayers grow coherently and epitaxially over VN sublayers under the critical modulation period. Correspondingly, the hardness and the modulus of the TiAlN/VN nano-multilayer films increase significantly, and the maximum hardness and elastic modulus of TiAlN (10 nm)/VN (10 nm) nano-multilayer films increase by about 39.3% and 40.9% compared with the TiAlN single film, respectively. The strengthening of the TiAlN/VN nano-multilayer films can be attributed to the coherent interfacial structure. In addition, the friction coefficient of TiAlN single film is about 0.9, while that of TiAlN/VN nano-multilayer films can be decreased significantly and reaches a minimum value of similar to 0.4 by the periodic insertion of the VN sublayers with lower friction coefficient similar to 0.3.