A novel template-release method for low-defect nanoimprint lithography

作者：Kitagawa Takuya; Nakamura Naoto; Kawata Hiroaki; Hirai Yoshihiko^*

来源：Microelectronic Engineering, 2014, 123: 65-72.

DOI：10.1016/j.mee.2014.05.016

• Template
• Release
• Nanoimprint
• Defect
• Damage
• Push back

Various template-releasing methods, including a newly proposed novel method for nanoimprint lithography, are examined and evaluated in terms of defect rates for line and pillar patterns. The newly proposed method, called the push-back method, shows excellent releasing performance. In the push-back method, a template is repeatedly pushed up and back to a resist pattern. We evaluated defect rates after template releasing for various methods using a newly developed tool controlled in multiple axes.

• 出版日期2014-7-1