Molecular Interaction Radii and Rate Constants for Clarifying Organic Compound Physisorption on Silicon Surface

作者:Habuka Hitoshi*; Naito Tatsuhito; Kawahara Norihiro
来源:Journal of the Electrochemical Society, 2010, 157(11): H1014-H1018.
DOI:10.1149/1.3489364

摘要

For describing the organic compound physisorption on a silicon surface, a method for systematically obtaining the physisorption and desorption rate constants of organic compounds was developed. Additionally, an equation for describing the surface concentration of organic compounds in a steady state was derived, taking into account the rate constants of physisorption and desorption and the molecular interaction radii for occupying the silicon surface. In a three-component system consisting of isopropyl alcohol, diethylphthalate, and octanol, the calculated surface concentrations showed a correlation to that of the in situ measurement using a quartz crystal microbalance. Thus, the equation obtained in this study is expected to predict an airborne organic contamination behavior in a multicomponent system.

  • 出版日期2010