Depth Profiling of Anodic Tantalum Oxide Films with Gold Cluster Ions

作者:Poerschke David; Wucher Andreas*
来源:Surface and Interface Analysis, 2011, 43(1-2): 171-174.
DOI:10.1002/sia.3441

摘要

In order to investigate the merits of cluster bombardment for inorganic sputter depth profiling, thin (50-nm) anodic Ta2O5 films were analyzed by ToF-SNMS using 25 keV Au-n(+) projectile ions. The same focused primary ion beam was employed both for sputter erosion and (static) data acquisition. Sputtered neutral particles were postionized by means of single photon ionization using a 157 nm F-2 excimer laser. The results show that, for the amorphous films investigated here, the transition from mono-to-polyatomic projectiles does not lead to a significant improvement of the apparent depth resolution.

  • 出版日期2011-2