NANOSTRUCTURE OF TiO2 THIN FILMS PREPARED BY UNBALANCED MAGNETRON SPUTTERING

作者：Pokaipisit Artorn^*; Chaiyakun Surasing; Limsuwan Pichet; Ngotawornchai Boonlaer

来源：International Journal of Modern Physics B, 2009, 23(10): 2395-2403.

DOI：10.1142/s0217979209052297

• Oxide
• sputtering
• atomic force microscopy
• surface properties

In this study, titanium dioxide (TiO2) thin films were deposited on unheated glass substrates using an unbalanced magnetron sputtering system with different deposition times of 25, 35 and 45 min, respectively. The structure and surface morphology of TiO2 thin films were characterized by atomic force microscopy (AFM) and transmission electron microscopy (TEM) with selected-area electron diffraction (SAED). It was found that the crystallite size of TiO2 thin films was in the range of 10-20 nm, and the surface roughness was 1-3 nm. The SAED patterns show that the phase of TiO2 thin films obtained in this study is anatase phase.

• 出版日期2009-4-20