Amorphous Zr-Cu thin-film alloys with metallic glass behavior

作者：Zeman P^*; Zitek M; Zuzjakova S; Cerstvy R

来源：Journal of Alloys and Compounds, 2017, 696: 1298-1306.

DOI：10.1016/j.jallcom.2016.12.098

• Zr-Cu
• Amorphous material
• Metallic glass
• Thin films
• Magnetron sputtering

Binary Zr-Cu thin-film alloys were prepared by non-reactive conventional dc and impulse magnetron co-sputtering using two unbalanced magnetrons equipped with Zr and Cu targets. The magnetron with the Zr target was operated in a dc regime while the magnetron with the Cu target in a pulse regime either at low or high density discharge conditions. The elemental composition in the films was controlled in a very wide composition range (similar to 10-90 at.%). The evolution of the structure, thermal behavior, mechanical, electrical and surface properties of Zr-Cu films with increasing Cu content was systematically investigated. We found that Zr-Cu thin-film metallic glasses were prepared with the Cu content between approximately 30 and 65 at.% Cu independently of the low or high density discharge conditions used. A clear correlation between the evolution of the crystallization temperature and mechanical properties with increasing Cu content was observed. The deposition at the high density discharge conditions resulted in a preparation of the Zr-Cu thin-film metallic alloys with a compressive stress (<0 GPa), an enhanced hardness (>7 GPa), very smooth (surface roughness < 1 nm) and hydrophobic (water contact angle > 100 degrees) surface.

• 出版日期2017-3-5