Secondary spot for pulsed laser SEE testing

作者:Jiang, Yu-Guang; Feng, Guo-Qiang; Zhu, Xiang; Ma, Ying-Qi; Shangguan, Shi-Peng; Yu, Yong-Tao; Han, Jian-Wei
来源:Atomic Energy Science and Technology, 2013, 47(12): 2361-2364.
DOI:10.7538/yzk.2013.47.12.2361

摘要

The pulsed laser is an effective method to simulate single event effect (SEE) induced by heavy ions. When the laser focused on the chip surface using the backside approach, the laser spot was observed. The experiment data of Si substrate and Si wafer show that the secondary spot is formed due to the reflection of metal layer, and it is verified by the thickness of Si substrate and the depth of laser focusing.

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