Analysis of the optic/impurity-particle/pad interaction for reduction of scratches formed on optics during pad polishing

作者：Liao Defeng^*; Wang Jian; Zhao Shijie; Xie Ruiqing; Chen Xianhua; Yuan Zhigang; Zhong Bo; Xu Xi; Zhang Shuai

来源：Journal of Non-Crystalline Solids, 2014, 391: 96-100.

DOI：10.1016/j.jnoncrysol.2014.03.018

• Scratch formation
• Pad polishing
• Impurity particle
• Interaction model

A model for interactions of a single large impurity particle with the optic and pad during pad-polishing has been developed to detailedly illustrate the scratch formation process. Equations for calculating the normal load applied on the optic by the impurity particle are provided, and the friction between the optic and impurity particle has also been considered in scratch formation. Initiation and evolution of the scratches under the combined effects of the normal and friction forces are illustrated in the model. The most important factors affecting the normal load and thus scratch formation have been analyzed and verified using published experimental results. Based on the model, the implications in reduction of scratch formed on optics during pad polishing have been analyzed.

• 出版日期2014-5-1