摘要
Amorphous zirconium oxide (a-ZrO2) thin films were prepared onto fuzzed quartz substrates by ion beam sputtering deposition (IBSD) method in (Ar + O-2) gas mixture. Optical parameters of the films were evaluated by laser ellipsometry (lambda = 632.8 nm) and optical transmission measurements. Structural parameters were studied by XRD measurements. Variation of refractive index and film thickness have been defined as a function of time of high-temperature annealing at T = 900 degrees C. Formation of monoclinic zirconium oxide (m-ZrO2) nanocrystals with diameter of similar to 60 nm embedded into a-ZrO2 matrix has been found by XRD analysis after long-time annealing.
- 出版日期2012-1-20