Analysis of fabricating arbitrary nanoscale patterns by LSPP direct writing lithography with two-dimensional metal hole-array

作者：Shi, Sha; Zhang, Zhiyou; Shi, Ruiying; Niu, Xiaoyun; Li, Shuhong; Li, Min; Wang, Jingquan; Du, Jinglei^*; Gao, Fuhua; Du, Chunlei

来源：Microelectronic Engineering, 2011, 88(8): 1931-1934.

DOI：10.1016/j.mee.2011.02.027

• TMH
• Local surface plasmon polariton
• Parallel direct writing lithography

We propose to use two-dimensional metal hole-array (TMH) and spatial light modulator (SLM) technology to construct a parallel direct-writing system. SLM and movable platform are used to control the system for realizing multi-beam parallel scanning exposure to fabricate arbitrary patterns. In this system TMH is the key component which focuses the incident light beams into light spots in the photoresist by exciting local surface plasmon polariton (LSPP). Parameters of TMH are optimized to improve the focusing efficiency and transmission depth of the light spots. Theoretical analysis and numerical simulations show that the feature size and transmission depth can reach sub-80 nm and 90 nm, respectively, by an optimized TMH, which is feasible for parallel direct writing lithography.

• 出版日期2011-8
• 单位中国科学院光电技术研究所; 四川大学