Mechanical responses of Zn1-xMnxO epitaxial thin films

作者：Chang, Teng-Ruey; Tsai, Chien-Huang^*

来源：Applied Surface Science, 2011, 258(1): 614-617.

DOI：10.1016/j.apsusc.2011.06.131

• Plasma-assisted molecular beam epitaxy
• Nanoindentation
• High-resolution transmission electron microscopy
• Hardness

In this study, we used nanoindentation to investigate the effect of the doping of Mn into ZnO buffer layers on the epitaxial growth of ZnO through plasma-assisted molecular beam epitaxy on c-plane sapphire substrates. We characterized the variation of the mechanical properties of Zn1-xMnxO alloys as a function of the Mn content in the range (x) from 0 to 0.16, as well as analyzing their microstructures using high-resolution transmission electron microscopy. The presence of the Mn-doped ZnO buffer layer enhanced the nanomechanical properties of the ZnO epilayers significantly. From their Berkovich indenter responses, plots of the Young's modulus (E) and hardness (H) of these films revealed that the value of E increased relatively steadily upon increasing the Mn composition, whereas the value of H reached its maximum when x was equal to 0.16. This discrepancy suggests that Zn1-xMnxO epilayers of higher Mn contents had higher shear resistances.

• 出版日期2011-10-15
• 单位南开大学