Nondestructive nanofabrication on monocrystalline silicon via site-controlled formation and removal of oxide mask

作者：Guo, Guangran; Li, Jiaming; Deng, Changbang; He, Qipei; Yu, Qingyuan; Zhou, Chao; Liu, Xiaoxiao; Jiang, Shulan; Chen, Lei; Yu, Bingjun^*; Qian, Linmao

来源：Applied Physics Express, 2018, 11(11): 116501.

DOI：10.7567/APEX.11.116501

• LIGHT-EMITTING-DIODES
• PHASE-TRANSFORMATION
• SUBSTRATE
• SURFACE

A nondestructively patterned silicon substrate serves as an ideal support for forming high-quality optical structures or devices. A new approach was proposed for fabricating site-controlled structures without destruction on a monocrystalline silicon surface via local anodic oxidation (LAO) and two-step postetching. The nondestruction was demonstrated by conductivity detection with conductive atomic force microscopy (AFM), and an almost perfect crystal lattice was observed from the fabricated hillock by high-resolution transmission electron microscopy (HRTEM). By programming AFM tip traces for LAO processing, site-controlled nondestructive patterns with different layouts can be produced. This approach provides a new route for realizing nondestructive optical substrates.

• 出版日期2018-11
• 单位西南交通大学